Optical Nanostructures in CMOS Technology

Optical nanostructures in CMOS technology concerns the ability to structure the metal surfaces employed within a modern semiconductor process at the nanometer scale in such a way that they allow complex color and/or polarization sensors to be manufactured at a reasonable price. This calls for an understanding of surface plasmon effects in metals and materials relevant to CMOS as well as the optics expertise to design filters – expertise that Fraunhofer IIS possesses. Fraunhofer IIS has also developed the capacity to optically model nanostructured metals, along with simulation and design capabilities for nanostructured color and polarization sensors.

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